@article{452b4241d7b146c6aa3adc52b8c2fe0c,
title = "Characterization and electrical properties of high-k GdScO3 thin films grown by atomic layer deposition",
keywords = "high.k, atomic layer deposition, rare earth oxide, high.k, atomic layer deposition, rare earth oxide, high.k, atomic layer deposition, rare earth oxide",
author = "Pia Myllym{\"a}ki and Martin Roeckerath and Matti Putkonen and Steffi Lenk and J{\"u}rgen Schubert and Lauri Niinist{\"o} and Siegfried Mantl",
year = "2007",
language = "English",
volume = "88",
pages = "633--637",
journal = "Applied Physics A: Materials Science and Processing",
issn = "0947-8396",
publisher = "Springer",
number = "4",
}