Characterization and electrical properties of high-k GdScO3 thin films grown by atomic layer deposition

Pia Myllymäki, Martin Roeckerath, Matti Putkonen, Steffi Lenk, Jürgen Schubert, Lauri Niinistö, Siegfried Mantl

    Research output: Contribution to journalArticleScientificpeer-review

    23 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)633-637
    JournalAPPLIED PHYSICS A-MATERIALS SCIENCE AND PROCESSING
    Volume88
    Issue number4
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

    Keywords

    • high.k, atomic layer deposition, rare earth oxide

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