Cadmium Telluride X-ray pad detectors with different passivation dielectrics

A. Gädda*, J. Ott, A. Karadzhinova-Ferrer, M. Golovleva, M. Kalliokoski, A. Winkler, P. Luukka, J. Härkönen

*Corresponding author for this work

Research output: Contribution to journalReview Articlepeer-review

7 Citations (Scopus)

Abstract

The suitability of two low-temperature dielectric passivation layer processes for the fabrication of Cadmium Telluride (CdTe) X-ray detectors has been investigated. The CdTe crystals with a size of (10×10×1)mm 3 were coated with sputtered aluminum nitride (AlN) or with aluminum oxide (Al 2 O 3 ) grown by the atomic layer deposition (ALD) method. The metallization contacts of the detectors were made by titanium tungsten (TiW) and gold (Au) metal sputtering depositions. The pad detector structures were patterned with proximity-contactless photolithography techniques followed by lift-off patterning of the electrodes. The detector properties were characterized at room temperature by Transient Current Technique (TCT) measurements. The obtained results were compared and verified by numerical TCAD simulations of the detector response. Our results indicate that higher signal charge was collected from samples with Al 2 O 3 . Furthermore, no significant laser light induced signal decay by CdTe material polarization was observed within order of 30 min of continuous illumination.

Original languageEnglish
Pages (from-to)33-37
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume924
DOIs
Publication statusPublished - 21 Apr 2019
MoE publication typeA2 Review article, Literature review, Systematic review

Keywords

  • Atomic layer deposition (ALD)
  • Cadmium Telluride (CdTe)
  • X-ray detector

Fingerprint

Dive into the research topics of 'Cadmium Telluride X-ray pad detectors with different passivation dielectrics'. Together they form a unique fingerprint.

Cite this