Blocking the Lateral Film Growth at the Nanoscale in Area-Selective Atomic Layer Deposition

Robin H.A. Ras, Elina Sahramo, Jari Malm, Janne Raula, Maarit Karppinen

Research output: Contribution to journalArticleScientificpeer-review

44 Citations (Scopus)
Original languageEnglish
Pages (from-to)11252-11253
Number of pages2
JournalJournal of the American Chemical Society
Issue number34
Publication statusPublished - 2008
MoE publication typeA1 Journal article-refereed

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