Blistering effect in ALD Al2O3 thin films grown with timethylaluminum and water

Maria Berdova, Ville Rontu, Timo Sajavaara, Antti-Pekka Eskelinen, Sami Franssila

Research output: Contribution to conferencePaperScientific

Original languageEnglish
Publication statusPublished - 12 May 2014
MoE publication typeNot Eligible
EventInternational Baltic Conference on Atomic Layer Deposition - Helsinki, Finland
Duration: 12 May 201413 May 2014
Conference number: 12

Conference

ConferenceInternational Baltic Conference on Atomic Layer Deposition
Abbreviated titleBaltic ALD
CountryFinland
CityHelsinki
Period12/05/201413/05/2014

Equipment

OtaNano

Anna Rissanen (Manager)

Aalto University

Facility/equipment: Facility

  • Cite this

    Berdova, M., Rontu, V., Sajavaara, T., Eskelinen, A-P., & Franssila, S. (2014). Blistering effect in ALD Al2O3 thin films grown with timethylaluminum and water. Paper presented at International Baltic Conference on Atomic Layer Deposition, Helsinki, Finland.