Biocompatible ALD barrier coatings for medical devices

Mikko Matvejeff*, Satu Ek, Riina Ritasalo, Jesse Kalliomaki, Paivi Jarvinen, Oili Ylivaara, Erik Ostreng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Abstract

Atomic layer deposition (ALD) is widely in use for depositing a variety of materials, such as metal oxides, metal nitrides and metals, in a conformal and defectfree form at low temperatures on high aspect-ratio substrates. These advantages make ALD uniquely powerful method for applications where sensitive substrate materials combine with extreme demands on coating quality and temperature/ chemical resistance, such as those often seen in the medical applications.

Original languageEnglish
Title of host publication2017 IEEE ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM)
PublisherIEEE
Pages56-58
Number of pages3
ISBN (Electronic)978-1-5090-4660-7
DOIs
Publication statusPublished - 2017
MoE publication typeA4 Article in a conference publication
EventIEEE Electron Devices Technology and Manufacturing Conference - Toyama, Japan
Duration: 28 Feb 20172 Mar 2017

Conference

ConferenceIEEE Electron Devices Technology and Manufacturing Conference
Abbreviated titleEDTM
CountryJapan
CityToyama
Period28/02/201702/03/2017

Keywords

  • ALD
  • medical device and barrier layer
  • ATOMIC LAYER DEPOSITION

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