Atomistic simulations of surface coverage effects in anisotropic wet chemical etching of crystalline silicon

Miguel Gosálvez, Adam Foster, Risto Nieminen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publication3rd Workshop on Physical Chemistry of Wet Etching of Silicon, Nara, Japan, June 4-6, 2002
EditorsK. Sato
Pages37-40
Publication statusPublished - 2002
MoE publication typeA4 Conference publication

Keywords

  • anisotropic wet chemical etching
  • cellular automaton
  • surface coverage
  • surface termination

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