Atomic/molecular layer deposition: A direct gas-phase route to crystalline metal-organic framework thin films

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Abstract

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.

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Original languageEnglish
Pages (from-to)1139-1142
Number of pages4
JournalChemical Communications
Volume52
Issue number6
Publication statusPublished - 2016
MoE publication typeA1 Journal article-refereed

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