Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release

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@article{94ea016d3c484d67a8f01811e1a3a983,
title = "Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release",
abstract = "The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.",
keywords = "atomic layer deposition, azobenzene, metal-organic frameworks, molecular layer deposition, thin films, METAL-ORGANIC FRAMEWORKS, CARBON-DIOXIDE, XPS SPECTRA, ISOMERIZATION, CAPTURE, PHOTOISOMERIZATION, TRIMETHYLALUMINUM, ROUTE, ACIDS",
author = "Aida Khayyami and Anish Philip and Maarit Karppinen",
note = "| openaire: EC/H2020/339478/EU//LAYERENG-HYBMAT",
year = "2019",
month = "8",
day = "13",
doi = "10.1002/anie.201908164",
language = "English",
journal = "Angewandte Chemie",
issn = "1433-7851",

}

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TY - JOUR

T1 - Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release

AU - Khayyami, Aida

AU - Philip, Anish

AU - Karppinen, Maarit

N1 - | openaire: EC/H2020/339478/EU//LAYERENG-HYBMAT

PY - 2019/8/13

Y1 - 2019/8/13

N2 - The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.

AB - The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.

KW - atomic layer deposition

KW - azobenzene

KW - metal-organic frameworks

KW - molecular layer deposition

KW - thin films

KW - METAL-ORGANIC FRAMEWORKS

KW - CARBON-DIOXIDE

KW - XPS SPECTRA

KW - ISOMERIZATION

KW - CAPTURE

KW - PHOTOISOMERIZATION

KW - TRIMETHYLALUMINUM

KW - ROUTE

KW - ACIDS

U2 - 10.1002/anie.201908164

DO - 10.1002/anie.201908164

M3 - Article

JO - Angewandte Chemie

JF - Angewandte Chemie

SN - 1433-7851

ER -

ID: 36538709