Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release

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The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.


Original languageEnglish
Number of pages6
JournalAngewandte Chemie
Publication statusPublished - 13 Aug 2019
MoE publication typeA1 Journal article-refereed

    Research areas

  • atomic layer deposition, azobenzene, metal-organic frameworks, molecular layer deposition, thin films, METAL-ORGANIC FRAMEWORKS, CARBON-DIOXIDE, XPS SPECTRA, ISOMERIZATION, CAPTURE, PHOTOISOMERIZATION, TRIMETHYLALUMINUM, ROUTE, ACIDS

ID: 36538709