Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release

Aida Khayyami, Anish Philip, Maarit Karppinen*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

Abstract

The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.

Original languageEnglish
Number of pages6
JournalAngewandte Chemie
DOIs
Publication statusPublished - 13 Aug 2019
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer deposition
  • azobenzene
  • metal-organic frameworks
  • molecular layer deposition
  • thin films
  • METAL-ORGANIC FRAMEWORKS
  • CARBON-DIOXIDE
  • XPS SPECTRA
  • ISOMERIZATION
  • CAPTURE
  • PHOTOISOMERIZATION
  • TRIMETHYLALUMINUM
  • ROUTE
  • ACIDS

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