Atomic-scale modeling of the ion-beam-induced growth of amorphous carbon

M. Kaukonen, R.M. Nieminen

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The results of a detailed molecular-dynamics study of the growth of amorphous carbon (a−C) are reported. Carbon atoms with kinetic energies between 10 and 150 eV are deposited on a−C surface originating from bulk a−C. Earlier simulation results of an optimal energy window at 40–70 eV are confirmed. Additionally, it is found that the growth rate is at maximum at around 40 eV. At low implantation energies (Ebeam≈10eV), the growth of amorphous carbon takes place on the surface. At higher energies, the growth proceeds increasingly in the subsurface region by global film expansion and single atom diffusion towards the surface. Scattering events (e.g., the deposited atom does not adsorb to the surface) at intermediate energies Ebeam≈100eV result in a densification of the growing film. Moreover, at Ebeam≈150eV, nonpermanent diamond formation is observed.
Original languageEnglish
Pages (from-to)2806-2811
JournalPhysical Review B
Issue number4
Publication statusPublished - 2000
MoE publication typeA1 Journal article-refereed

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