Atomic layer epitaxy deposition of CeO2 and Y2O3 overlayers on silicon

H. Mölsä, L. Niinistö

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publication2nd International Conference on f-Elements, ICFE-2, Programme and Abstracts, Helsinki, 1.-6.8.1994
    Place of PublicationJyväskylä
    PagesPH1
    Publication statusPublished - 1994
    MoE publication typeA4 Article in a conference publication

    Keywords

    • atomic layer epitaxy
    • cerium dioxide
    • deposition
    • thin film
    • yttrium oxide

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