Atomic layer deposition of ZrO2 and HfO2 on deep trenched and planar silicon

Kaupo Kukli, Jaakko Niinistö, Aile Tamm, Jun Lu, Mikko Ritala, Markku Leskelä, Matti Putkonen, Lauri Niinistö, Fuquan Song, Paul Williams, Peter N Heys

    Research output: Contribution to journalArticleScientificpeer-review

    32 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)2010-2013
    JournalMicroelectronic Engineering
    Issue number9-10
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

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