Atomic Layer Deposition of Tungsten(III) Oxide Thin Films From W2(NMe2)6 and Water.Precursor-Based Control of Oxidation State in the Thin Film Material

Charles L. Dezelah IV, Oussama M. El-Kadri, Imre M. Szilágyi, Joseph M. Campbell, Kai Arstila, Lauri Niinistö, Charles H. Winter

    Research output: Contribution to journalArticleScientificpeer-review

    32 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)9638-9639
    JournalJournal of the American Chemical Society
    Issue number30
    Publication statusPublished - 2006
    MoE publication typeA1 Journal article-refereed

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