Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers

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Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers. / Rönn, John; Karvonen, Lasse; Pyymaki-Perros, Alexander; Peyghambarian, Nasser N.; Lipsanen, Harri; Säynätjoki, Antti; Sun, Zhipei.

2016. 98910Y Paper presented at Conference on Silicon Photonics and Photonic Integrated Circuits, Brussels, Belgium.

Research output: Contribution to conferencePaperScientific

Harvard

Rönn, J, Karvonen, L, Pyymaki-Perros, A, Peyghambarian, NN, Lipsanen, H, Säynätjoki, A & Sun, Z 2016, 'Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers' Paper presented at Conference on Silicon Photonics and Photonic Integrated Circuits, Brussels, Belgium, 03/04/2016 - 07/04/2016, pp. 98910Y. https://doi.org/10.1117/12.2227640

APA

Rönn, J., Karvonen, L., Pyymaki-Perros, A., Peyghambarian, N. N., Lipsanen, H., Säynätjoki, A., & Sun, Z. (2016). Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers. 98910Y. Paper presented at Conference on Silicon Photonics and Photonic Integrated Circuits, Brussels, Belgium. https://doi.org/10.1117/12.2227640

Vancouver

Rönn J, Karvonen L, Pyymaki-Perros A, Peyghambarian NN, Lipsanen H, Säynätjoki A et al. Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers. 2016. Paper presented at Conference on Silicon Photonics and Photonic Integrated Circuits, Brussels, Belgium. https://doi.org/10.1117/12.2227640

Author

Rönn, John ; Karvonen, Lasse ; Pyymaki-Perros, Alexander ; Peyghambarian, Nasser N. ; Lipsanen, Harri ; Säynätjoki, Antti ; Sun, Zhipei. / Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers. Paper presented at Conference on Silicon Photonics and Photonic Integrated Circuits, Brussels, Belgium.1 p.

Bibtex - Download

@conference{54d6e3c2a9874d06a802cafe72a1cf5d,
title = "Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers",
author = "John R{\"o}nn and Lasse Karvonen and Alexander Pyymaki-Perros and Peyghambarian, {Nasser N.} and Harri Lipsanen and Antti S{\"a}yn{\"a}tjoki and Zhipei Sun",
year = "2016",
doi = "10.1117/12.2227640",
language = "English",
pages = "98910Y",
note = "Conference on Silicon Photonics and Photonic Integrated Circuits ; Conference date: 03-04-2016 Through 07-04-2016",

}

RIS - Download

TY - CONF

T1 - Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers

AU - Rönn, John

AU - Karvonen, Lasse

AU - Pyymaki-Perros, Alexander

AU - Peyghambarian, Nasser N.

AU - Lipsanen, Harri

AU - Säynätjoki, Antti

AU - Sun, Zhipei

PY - 2016

Y1 - 2016

U2 - 10.1117/12.2227640

DO - 10.1117/12.2227640

M3 - Paper

SP - 98910Y

ER -

ID: 10727592