Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures

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Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures. / Niinistö, J.; Putkonen, M.; Niinistö, Lauri; Song, F.; Williams, P.; Heys, P.N.; Odedra, R.

In: Chemistry of Materials, Vol. 19, No. 13, 2007, p. 3319-3324.

Research output: Contribution to journalArticle

Harvard

Niinistö, J, Putkonen, M, Niinistö, L, Song, F, Williams, P, Heys, PN & Odedra, R 2007, 'Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures', Chemistry of Materials, vol. 19, no. 13, pp. 3319-3324.

APA

Niinistö, J., Putkonen, M., Niinistö, L., Song, F., Williams, P., Heys, P. N., & Odedra, R. (2007). Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures. Chemistry of Materials, 19(13), 3319-3324.

Vancouver

Niinistö J, Putkonen M, Niinistö L, Song F, Williams P, Heys PN et al. Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures. Chemistry of Materials. 2007;19(13):3319-3324.

Author

Niinistö, J. ; Putkonen, M. ; Niinistö, Lauri ; Song, F. ; Williams, P. ; Heys, P.N. ; Odedra, R. / Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures. In: Chemistry of Materials. 2007 ; Vol. 19, No. 13. pp. 3319-3324.

Bibtex - Download

@article{a34e735e897a498a8701c860f91fed7b,
title = "Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures",
author = "J. Niinist{\"o} and M. Putkonen and Lauri Niinist{\"o} and F. Song and P. Williams and P.N. Heys and R. Odedra",
year = "2007",
language = "English",
volume = "19",
pages = "3319--3324",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "AMERICAN CHEMICAL SOCIETY",
number = "13",

}

RIS - Download

TY - JOUR

T1 - Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures

AU - Niinistö, J.

AU - Putkonen, M.

AU - Niinistö, Lauri

AU - Song, F.

AU - Williams, P.

AU - Heys, P.N.

AU - Odedra, R.

PY - 2007

Y1 - 2007

M3 - Article

VL - 19

SP - 3319

EP - 3324

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 13

ER -

ID: 2409776