Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures

Research output: Contribution to journalArticleScientificpeer-review

Researchers

  • J. Niinistö
  • M. Putkonen
  • Lauri Niinistö
  • F. Song
  • P. Williams
  • P.N. Heys
  • R. Odedra

Research units

Details

Original languageEnglish
Pages (from-to)3319-3324
JournalChemistry of Materials
Volume19
Issue number13
Publication statusPublished - 2007
MoE publication typeA1 Journal article-refereed

ID: 2409776