Original language | English |
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Pages (from-to) | 3319-3324 |
Journal | Chemistry of Materials |
Volume | 19 |
Issue number | 13 |
Publication status | Published - 2007 |
MoE publication type | A1 Journal article-refereed |
Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures
J. Niinistö, M. Putkonen, Lauri Niinistö, F. Song, P. Williams, P.N. Heys, R. Odedra
Research output: Contribution to journal › Article › Scientific › peer-review
55
Citations
(Scopus)