Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures

J. Niinistö, M. Putkonen, Lauri Niinistö, F. Song, P. Williams, P.N. Heys, R. Odedra

    Research output: Contribution to journalArticleScientificpeer-review

    55 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)3319-3324
    JournalChemistry of Materials
    Issue number13
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

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