Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

Harry Alles, Jaan Aarik, Aleks Aidla, Aurelien Fay, Jekaterina Kozlova, Ahti Niilisk, Martti Pärs, Mihkel Rähn, Maciej Wiesner, Pertti Hakonen, Väino Sammelselg

Research output: Contribution to journalArticleScientificpeer-review

25 Citations (Scopus)
Original languageEnglish
Pages (from-to)319-324
Number of pages6
JournalCENTRAL EUROPEAN JOURNAL OF PHYSICS
Volume9
Issue number2
DOIs
Publication statusPublished - 2011
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer depostion
  • graphene
  • high-k dielectric thin films
  • nanoelectronics

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