@article{4a3c0d34264b402cb45a058816da633b,
title = "Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O",
keywords = "atomic layer depostion, graphene, high-k dielectric thin films, nanoelectronics, atomic layer depostion, graphene, high-k dielectric thin films, nanoelectronics, atomic layer depostion, graphene, high-k dielectric thin films, nanoelectronics",
author = "Harry Alles and Jaan Aarik and Aleks Aidla and Aurelien Fay and Jekaterina Kozlova and Ahti Niilisk and Martti P{\"a}rs and Mihkel R{\"a}hn and Maciej Wiesner and Pertti Hakonen and V{\"a}ino Sammelselg",
year = "2011",
doi = "10.2478/s11534-010-0040-x",
language = "English",
volume = "9",
pages = "319--324",
journal = "Central European Journal of Physics ",
issn = "1895-1082",
publisher = "Springer",
number = "2",
}