Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures

Jaakko Niinistö; Matti Putkonen; Charles L. Dezelah IV; Fuquan Song; Paul Williams; Peter N. Heyes; Kaupo Kukli; Mikko Ritala; Markku Leskelä; Lauri Niinistö

Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures

Jaakko Niinistö, Matti Putkonen, Charles L. Dezelah IV, Fuquan Song, Paul Williams, Peter N. Heyes, Kaupo Kukli, Mikko Ritala, Markku Leskelä, Lauri Niinistö

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Original language	English
Title of host publication	ALD 2007, 7th International Conference on Atomic Layer Deposition, Kona Kai Resort, San Diego, California, 24-27 June 2007
Publication status	Published - 2007
MoE publication type	A4 Conference publication

Cite this

Niinistö, J., Putkonen, M., Dezelah IV, C. L., Song, F., Williams, P., Heyes, P. N., Kukli, K., Ritala, M., Leskelä, M., & Niinistö, L. (2007). Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures. In ALD 2007, 7th International Conference on Atomic Layer Deposition, Kona Kai Resort, San Diego, California, 24-27 June 2007

@inproceedings{9dc9228cf2044b059233a9acfc270ed9,

title = "Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures",

author = "Jaakko Niinist{\"o} and Matti Putkonen and \{Dezelah IV\}, \{Charles L.\} and Fuquan Song and Paul Williams and Heyes, \{Peter N.\} and Kaupo Kukli and Mikko Ritala and Markku Leskel{\"a} and Lauri Niinist{\"o}",

year = "2007",

language = "English",

booktitle = "ALD 2007, 7th International Conference on Atomic Layer Deposition, Kona Kai Resort, San Diego, California, 24-27 June 2007",

}

Niinistö, J, Putkonen, M, Dezelah IV, CL, Song, F, Williams, P, Heyes, PN, Kukli, K, Ritala, M, Leskelä, M & Niinistö, L 2007, Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures. in ALD 2007, 7th International Conference on Atomic Layer Deposition, Kona Kai Resort, San Diego, California, 24-27 June 2007.

Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures. / Niinistö, Jaakko; Putkonen, Matti; Dezelah IV, Charles L. et al.
ALD 2007, 7th International Conference on Atomic Layer Deposition, Kona Kai Resort, San Diego, California, 24-27 June 2007. 2007.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Atomic Layer Deposition of HfO2 and ZrO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors with Ozone at High Temperatures

AU - Niinistö, Jaakko

AU - Putkonen, Matti

AU - Dezelah IV, Charles L.

AU - Song, Fuquan

AU - Williams, Paul

AU - Heyes, Peter N.

AU - Kukli, Kaupo

AU - Ritala, Mikko

AU - Leskelä, Markku

AU - Niinistö, Lauri

PY - 2007

Y1 - 2007

M3 - Conference article in proceedings

BT - ALD 2007, 7th International Conference on Atomic Layer Deposition, Kona Kai Resort, San Diego, California, 24-27 June 2007

ER -