Atomic layer deposition of hafnium oxide on germanium substrates

Annelies Delabie*, Riikka L. Puurunen, Bert Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Olivier Richard, Wilfried Vandervorst, Chao Zhao, Marc M. Heyns, Marc Meuris, Minna M. Viitanen, Hidde H. Brongersma, Marco De Ridder, Lyudmila V. Goncharova, Eric Garfunkel, Torgny Gustafsson, Wilman Tsai

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

111 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Atomic layer deposition of hafnium oxide on germanium substrates'. Together they form a unique fingerprint.

Engineering

Material Science