Atomic Layer Deposition of Ga2O3 Films from a Dialkylamido-Based Precursor

Charles L. Dezelah IV, Jaakko Niinistö, Charles H. Winter, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    48 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)471-475
    JournalChemistry of Materials
    Volume18
    Publication statusPublished - 2006
    MoE publication typeA1 Journal article-refereed

    Cite this

    Dezelah IV, C. L., Niinistö, J., Winter, C. H., & Niinistö, L. (2006). Atomic Layer Deposition of Ga2O3 Films from a Dialkylamido-Based Precursor. Chemistry of Materials, 18, 471-475.