Atomic layer deposition of B2O3 thin films at room temperature

Matti Putkonen, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    48 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)145-149
    JournalThin Solid Films
    Volume514
    Publication statusPublished - 2006
    MoE publication typeA1 Journal article-refereed

    Keywords

    • Boron Oxide, Thin Films, Atomic Layer Deposition, ALD

    Cite this