Atomic Layer Deposition of Amino-Functionalized Silica Surfaces Using N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane as a Silylating Agent

Satu Ek; Eero I. Iiskola; Lauri Niinistö

Atomic Layer Deposition of Amino-Functionalized Silica Surfaces Using N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane as a Silylating Agent

Satu Ek, Eero I. Iiskola, Lauri Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

32 Citations (Scopus)

Original language	English
Journal	Journal of Physical Chemistry B
Publication status	Published - 2004
MoE publication type	A1 Journal article-refereed

Keywords

ALD (atomic layer deposition)
aminopropylsilane
gas-solid reactions
silica

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@article{423e81c091414c84b8e68943ae580810,

title = "Atomic Layer Deposition of Amino-Functionalized Silica Surfaces Using N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane as a Silylating Agent",

keywords = "ALD (atomic layer deposition), aminopropylsilane, gas-solid reactions, silica, ALD (atomic layer deposition), aminopropylsilane, gas-solid reactions, silica, ALD (atomic layer deposition), aminopropylsilane, gas-solid reactions, silica",

author = "Satu Ek and Iiskola, {Eero I.} and Lauri Niinist{\"o}",

year = "2004",

language = "English",

journal = "Journal of Physical Chemistry B",

issn = "1520-6106",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - Atomic Layer Deposition of Amino-Functionalized Silica Surfaces Using N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane as a Silylating Agent

AU - Ek, Satu

AU - Iiskola, Eero I.

AU - Niinistö, Lauri

PY - 2004

Y1 - 2004

KW - ALD (atomic layer deposition)

KW - aminopropylsilane

KW - gas-solid reactions

KW - silica

KW - ALD (atomic layer deposition)

KW - aminopropylsilane

KW - gas-solid reactions

KW - silica

KW - ALD (atomic layer deposition)

KW - aminopropylsilane

KW - gas-solid reactions

KW - silica

M3 - Article

JO - Journal of Physical Chemistry B

JF - Journal of Physical Chemistry B

SN - 1520-6106

ER -