Atomic layer deposition of AlN using atomic layer annealing - Towards high-quality AlN on vertical sidewalls

Elmeri Österlund*, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen, Mervi Paulasto-Kröckel

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)
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