Atomic Layer Deposition of a High-Density Aminopropylsiloxane Network on Silica through Sequential Reactions of gamma-aminopropyltrialkoxysilanes and Water

Satu Ek, Eero Iiskola, Lauri Niinistö, Jari Vaittinen, Tuula Pakkanen, Jetta Keränen, Aline Auroux

    Research output: Contribution to journalArticleScientificpeer-review

    48 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)10601-10609
    JournalLangmuir
    Volume19
    Issue number25
    Publication statusPublished - 2003
    MoE publication typeA1 Journal article-refereed

    Keywords

    • ALD
    • aminopropylsilane
    • APDMS
    • APTMS
    • APTS
    • atomic layer deposition
    • control of amino groups
    • modification of silica
    • surface saturation

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