Atomic layer deposition enhanced rapid dry fabrication of micromechanical devices with cryogenic deep raective ion etching

Nikolai Chekurov, Mika Koskenvuori, Veli-Matti Airaksinen, Ilkka Tittonen

    Research output: Contribution to journalArticleScientificpeer-review

    14 Citations (Scopus)
    Original languageEnglish
    JournalJournal of Micromechanics and Microengineering
    Volume17
    Issue number8
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer deposition
    • cryogenic etching
    • fabrication
    • micromechanic

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