Atomic layer deposition as pore diameter adjustment tool for nanoporous aluminum oxide injection molding masks

V. Miikkulainen, T. Rasilainen, E. Puukilainen, M. Suvanto, Tapani A. Pakkanen

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title = "Atomic layer deposition as pore diameter adjustment tool for nanoporous aluminum oxide injection molding masks",

author = "V. Miikkulainen and T. Rasilainen and E. Puukilainen and M. Suvanto and Pakkanen, {Tapani A.}",

year = "2008",

doi = "10.1021/la800285s",

language = "English",

journal = "Langmuir",

issn = "0743-7463",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - Atomic layer deposition as pore diameter adjustment tool for nanoporous aluminum oxide injection molding masks

AU - Miikkulainen, V.

AU - Rasilainen, T.

AU - Puukilainen, E.

AU - Suvanto, M.

AU - Pakkanen, Tapani A.

PY - 2008

Y1 - 2008

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-44249096386&partnerID=MN8TOARS

U2 - 10.1021/la800285s

DO - 10.1021/la800285s

M3 - Article

SN - 0743-7463

JO - Langmuir

JF - Langmuir

ER -