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Atomic layer deposition (ALD) technology: present status and future challenges

    Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

    Original languageEnglish
    Title of host publicationFirst Joint Workshop/Symposium of GUCAS and Finnish Graduate Schools in Beijing, May 20-22, 2009, Beijing, China
    Publication statusPublished - 2009
    MoE publication typeA4 Conference publication

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