Atomic layer deposition (ALD) of high quality Ga2O3 thin films from a dimeric dialkylamido-bridged gallium complex

Charles L. Dezelah IV, Jaakko Niinistö, Matti Putkonen, Kai Arstila, Charles H. Winter, Lauri Niinistö

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationThe AVS Topical Conference on Atomic Layer Deposition (ALD 2005), San Jose, CA, USA, August, 8-10, 2005
    Place of PublicationHelsinki
    PublisherAmerican vacuum society (AVS)
    Publication statusPublished - 2005
    MoE publication typeA4 Article in a conference publication

    Keywords

    • ALD
    • atomic layer deposition
    • Ga2O3 thin films

    Cite this