Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications

Lauri Niinistö

    Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

    Original languageEnglish
    Title of host publicationProceedings of the Estonian Academy of Sciences, Physics, Mathematics
    Place of PublicationTallinn
    Publication statusPublished - 2003
    MoE publication typeA3 Part of a book or another research book

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