Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications

Lauri Niinistö

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific › peer-review

Original language	English
Title of host publication	Proceedings of the Estonian Academy of Sciences, Physics, Mathematics
Place of Publication	Tallinn
Pages	266-276
Edition	52(3)
Publication status	Published - 2003
MoE publication type	A3 Part of a book or another research book

OpenUrl availability

@inbook{90d1a25683a94f71914d38e39391ef2b,

title = "Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications",

author = "Lauri Niinist{\"o}",

year = "2003",

language = "English",

pages = "266--276",

booktitle = "Proceedings of the Estonian Academy of Sciences, Physics, Mathematics",

edition = "52(3)",

}