@inproceedings{0b59216a427f45d0b8fd836c69e3aa12,
title = "Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications (invited)",
keywords = "ALD, insulating oxide layers, thin films, ALD, insulating oxide layers, thin films, ALD, insulating oxide layers, thin films",
author = "Lauri Niinist{\"o}",
year = "2002",
language = "English",
pages = "14",
editor = "A. Rosenthal",
booktitle = "The Fifth Baltic Symposium on Atomic Layer Deposition (BALD-5), Tartu, Estonia, 24-26 October 2002",
publisher = "University of Tartu",
address = "Estonia",
}