Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

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18 Citations (Scopus)

Original language	English
Journal	Journal of Vacuum Science & Technology A
DOIs	https://doi.org/10.1116/1.4890006
Publication status	Published - 2015
MoE publication type	A1 Journal article-refereed

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@article{abbc221eab254e8ab80e4b7ae8f81143,

title = "Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence",

author = "V. Miikkulainen and O. Nilsen and Han Li and S.W. King and Mikko Laitinen and Timo Sajavaara and H. Fjellv{\aa}g",

year = "2015",

doi = "10.1116/1.4890006",

language = "English",

journal = "Journal of Vacuum Science \& Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

}

TY - JOUR

T1 - Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

AU - Miikkulainen, V.

AU - Nilsen, O.

AU - Li, Han

AU - King, S.W.

AU - Laitinen, Mikko

AU - Sajavaara, Timo

AU - Fjellvåg, H.

PY - 2015

Y1 - 2015

UR - https://www.scopus.com/pages/publications/84905012182

U2 - 10.1116/1.4890006

DO - 10.1116/1.4890006

M3 - Article

SN - 0734-2101

JO - Journal of Vacuum Science & Technology A

JF - Journal of Vacuum Science & Technology A

ER -