Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

V. Miikkulainen, O. Nilsen, Han Li, S.W. King, Mikko Laitinen, Timo Sajavaara, H. Fjellvåg

Research output: Contribution to journal › Article › Scientific › peer-review

16 Citations (Scopus)

Original language	English
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
DOIs	https://doi.org/10.1116/1.4890006
Publication status	Published - 2015
MoE publication type	A1 Journal article-refereed

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author = "V. Miikkulainen and O. Nilsen and Han Li and S.W. King and Mikko Laitinen and Timo Sajavaara and H. Fjellv{\aa}g",

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T1 - Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

AU - Miikkulainen, V.

AU - Nilsen, O.

AU - Li, Han

AU - King, S.W.

AU - Laitinen, Mikko

AU - Sajavaara, Timo

AU - Fjellvåg, H.

PY - 2015

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DO - 10.1116/1.4890006

M3 - Article

SN - 0734-2101

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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