Atomic layer deposited alumina (A12O3) coating on thin film cryoresistors

Ossi Hahtele, Alenxandre Satrapinski, Päivi Sievilä, Nikolai Chekurov

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    2 Citations (Scopus)
    Original languageEnglish
    Title of host publicationConference Digest, CPEM 2008, Bloomfield, Colorado USA, 8-13 June
    Pages272-273
    Publication statusPublished - 2008
    MoE publication typeA4 Article in a conference publication

    Keywords

    • ALD
    • cryoresistor
    • passivation
    • stability

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