Atomic layer deposited alumina (A12O3) coating on thin film cryoresistors

Ossi Hahtele, Alenxandre Satrapinski, Päivi Sievilä, Nikolai Chekurov

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

2 Citations (Scopus)

Original language	English
Title of host publication	Conference Digest, CPEM 2008, Bloomfield, Colorado USA, 8-13 June
Pages	272-273
Publication status	Published - 2008
MoE publication type	A4 Article in a conference publication

Keywords

@inproceedings{7af0c38aa18345238f5d9d52000d68e8,

title = "Atomic layer deposited alumina (A12O3) coating on thin film cryoresistors",

keywords = "ALD, cryoresistor, passivation, stability, ALD, cryoresistor, passivation, stability, ALD, cryoresistor, passivation, stability",

author = "Ossi Hahtele and Alenxandre Satrapinski and P{\"a}ivi Sievil{\"a} and Nikolai Chekurov",

year = "2008",

language = "English",

pages = "272--273",

booktitle = "Conference Digest, CPEM 2008, Bloomfield, Colorado USA, 8-13 June",

}

TY - GEN

T1 - Atomic layer deposited alumina (A12O3) coating on thin film cryoresistors

AU - Hahtele, Ossi

AU - Satrapinski, Alenxandre

AU - Sievilä, Päivi

AU - Chekurov, Nikolai

PY - 2008

Y1 - 2008

KW - ALD

KW - cryoresistor

KW - passivation

KW - stability

KW - ALD

KW - cryoresistor

KW - passivation

KW - stability

KW - ALD

KW - cryoresistor

KW - passivation

KW - stability

M3 - Conference contribution

SP - 272

EP - 273

BT - Conference Digest, CPEM 2008, Bloomfield, Colorado USA, 8-13 June

ER -