Atomic laeyr deposited alumina (A12O3) thin films on a high-Q mechanical silicon oscillator

Research output: Contribution to journalArticleScientificpeer-review

Researchers

Research units

Details

Original languageEnglish
Pages (from-to)737-742
JournalJournal of Micromechanics and Microengineering
Volume17
Issue number4
Publication statusPublished - 2007
MoE publication typeA1 Journal article-refereed

    Research areas

  • atomic layer deposition, high-Q-mechanical oscillator, microsystems

ID: 3545955