Atomic laeyr deposited alumina (A12O3) thin films on a high-Q mechanical silicon oscillator

Ossi Hahtela, Päivi sievilä, Nikolai Chekurov, Ilkka Tittonen

    Research output: Contribution to journalArticleScientificpeer-review

    15 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)737-742
    JournalJournal of Micromechanics and Microengineering
    Volume17
    Issue number4
    Publication statusPublished - 2007
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer deposition
    • high-Q-mechanical oscillator
    • microsystems

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