Assessment of recent process analytical technology (PAT) trends: A multiauthor review

Levente L. Simon*, Hajnalka Pataki, György Marosi, Fabian Meemken, Konrad Hungerbühler, Alfons Baiker, Srinivas Tummala, Brian Glennon, Martin Kuentz, Gerry Steele, Herman J M Kramer, James W. Rydzak, Zengping Chen, Julian Morris, Francois Kjell, Ravendra Singh, Rafiqul Gani, Krist V. Gernaey, Marjatta Louhi-Kultanen, John OreillyNiklas Sandler, Osmo Antikainen, Jouko Yliruusi, Patrick Frohberg, Joachim Ulrich, Richard D. Braatz, Tom Leyssens, Moritz Von Stosch, Rui Oliveira, Reginald B H Tan, Huiquan Wu, Mansoor Khan, Des Ogrady, Anjan Pandey, Remko Westra, Emmanuel Delle-Case, Detlef Pape, Daniele Angelosante, Yannick Maret, Olivier Steiger, Miklós Lenner, Kaoutar Abbou-Oucherif, Zoltan K. Nagy, James D. Litster, Vamsi Krishna Kamaraju, Min Sen Chiu

*Corresponding author for this work

Research output: Contribution to journalReview Articlepeer-review

206 Citations (Scopus)

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Physics & Astronomy

Chemical Compounds