Application of ultra-thin aluminum oxide etch mask made by atomic layer deposition technique

K. Grigoras, L. Sainiemi, J. Tiilikainen, A. Säynätjoki, V-M. Airaksinen, S. Franssila

Research output: Contribution to journalArticleScientificpeer-review

32 Citations (Scopus)
316 Downloads (Pure)
Original languageEnglish
Pages (from-to)369-373
JournalJournal of Physics: Conference Series
Publication statusPublished - 2007
MoE publication typeA1 Journal article-refereed

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