Application of ultra-thin aluminium oxide mask made by atomic layer deposition technique

kestutis Grigoras, Veli-Matti Airaksinen, Sami Franssila, Lauri Sainiemi, Jouni Tiilikainen, Antti Säynätjoki

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationInternational Conference on Nanoscience and Technology, Basel, Sveitsi, 30.7-4.8.2006
PagesPaper #442
Publication statusPublished - 2006
MoE publication typeA4 Article in a conference publication

Cite this

Grigoras, K., Airaksinen, V-M., Franssila, S., Sainiemi, L., Tiilikainen, J., & Säynätjoki, A. (2006). Application of ultra-thin aluminium oxide mask made by atomic layer deposition technique. In International Conference on Nanoscience and Technology, Basel, Sveitsi, 30.7-4.8.2006 (pp. Paper #442)