Apparent activation energy during surface evolution by step formation and flow

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Apparent activation energy during surface evolution by step formation and flow. / Gosálvez, M.A.; Cheng, D.; Nieminen, Risto; Sato, K.

In: New Journal of Physics, Vol. 8, 269, 09.11.2006, p. 1-11.

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@article{dfd33802e44d41f7b5a39baa63b2ebb6,
title = "Apparent activation energy during surface evolution by step formation and flow",
abstract = "During growth and etching by step flow as examples of anisotropic surface processing the apparent activation energy of the growth/etch rate depends on orientation, increasing gradually as a principal, terrace-rich surface is approached. This behaviour is traditionally explained as a change in the dominating process from step propagation to island/pit nucleation. We show that the orientation dependence of the activation energy is actually the result of a traditionally disregarded temperature dependence in the number of active step sites and is not attributable to an increasing role of step nucleation nor to a purely geometrical decrease in the number of step sites. This modifies the traditional picture of the apparent energy for a principal surface and explains how the energy can be higher than, equal to or even lower than that for vicinal orientations.",
author = "M.A. Gos{\'a}lvez and D. Cheng and Risto Nieminen and K. Sato",
year = "2006",
month = "11",
day = "9",
doi = "10.1088/1367-2630/8/11/269",
language = "English",
volume = "8",
pages = "1--11",
journal = "New Journal of Physics",
issn = "1367-2630",

}

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TY - JOUR

T1 - Apparent activation energy during surface evolution by step formation and flow

AU - Gosálvez, M.A.

AU - Cheng, D.

AU - Nieminen, Risto

AU - Sato, K.

PY - 2006/11/9

Y1 - 2006/11/9

N2 - During growth and etching by step flow as examples of anisotropic surface processing the apparent activation energy of the growth/etch rate depends on orientation, increasing gradually as a principal, terrace-rich surface is approached. This behaviour is traditionally explained as a change in the dominating process from step propagation to island/pit nucleation. We show that the orientation dependence of the activation energy is actually the result of a traditionally disregarded temperature dependence in the number of active step sites and is not attributable to an increasing role of step nucleation nor to a purely geometrical decrease in the number of step sites. This modifies the traditional picture of the apparent energy for a principal surface and explains how the energy can be higher than, equal to or even lower than that for vicinal orientations.

AB - During growth and etching by step flow as examples of anisotropic surface processing the apparent activation energy of the growth/etch rate depends on orientation, increasing gradually as a principal, terrace-rich surface is approached. This behaviour is traditionally explained as a change in the dominating process from step propagation to island/pit nucleation. We show that the orientation dependence of the activation energy is actually the result of a traditionally disregarded temperature dependence in the number of active step sites and is not attributable to an increasing role of step nucleation nor to a purely geometrical decrease in the number of step sites. This modifies the traditional picture of the apparent energy for a principal surface and explains how the energy can be higher than, equal to or even lower than that for vicinal orientations.

UR - http://www.scopus.com/inward/record.url?scp=33750897173&partnerID=8YFLogxK

U2 - 10.1088/1367-2630/8/11/269

DO - 10.1088/1367-2630/8/11/269

M3 - Article

VL - 8

SP - 1

EP - 11

JO - New Journal of Physics

JF - New Journal of Physics

SN - 1367-2630

M1 - 269

ER -

ID: 14611418