Annealing Behaviour of Deuterium in Silicon Doped Carbon Films

Jari Likonen; E. Vainonen-Ahlgren; Tommy Ahlgren; S. Lehto; T. Sajavaara; Walter Rydman; J. Keinonen; Jukka Katainen; C.H. Wu

Annealing Behaviour of Deuterium in Silicon Doped Carbon Films

Jari Likonen, E. Vainonen-Ahlgren, Tommy Ahlgren, S. Lehto, T. Sajavaara, Walter Rydman, J. Keinonen, Jukka Katainen, C.H. Wu

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	445-450
Journal	Contributions to Plasma Physics
Volume	42
Issue number	2-4
Publication status	Published - 2002
MoE publication type	A1 Journal article-refereed

Keywords

DLC, Silicon, Carbon, Film

Cite this

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title = "Annealing Behaviour of Deuterium in Silicon Doped Carbon Films",

keywords = "DLC, Silicon, Carbon, Film, DLC, Silicon, Carbon, Film, DLC, Silicon, Carbon, Film",

author = "Jari Likonen and E. Vainonen-Ahlgren and Tommy Ahlgren and S. Lehto and T. Sajavaara and Walter Rydman and J. Keinonen and Jukka Katainen and C.H. Wu",

year = "2002",

language = "English",

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journal = "Contributions to Plasma Physics",

issn = "1521-3986",

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TY - JOUR

T1 - Annealing Behaviour of Deuterium in Silicon Doped Carbon Films

AU - Likonen, Jari

AU - Vainonen-Ahlgren, E.

AU - Ahlgren, Tommy

AU - Lehto, S.

AU - Sajavaara, T.

AU - Rydman, Walter

AU - Keinonen, J.

AU - Katainen, Jukka

AU - Wu, C.H.

PY - 2002

Y1 - 2002

KW - DLC, Silicon, Carbon, Film

UR - https://www.scopus.com/pages/publications/0036012024

M3 - Article

SN - 1521-3986

VL - 42

SP - 445

EP - 450

JO - Contributions to Plasma Physics

JF - Contributions to Plasma Physics

IS - 2-4

ER -

Annealing Behaviour of Deuterium in Silicon Doped Carbon Films

Keywords

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Cite this