Anisotropic wet chemical etching of crystalline silicon: atomistic Monte-Carlo simulations and experiments

Miguel A. Gosalvez, Risto Nieminen, P. Kilpinen, Eero Haimi, Veikko K. Lindroos

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Pages (from-to)7-26
JournalApplied Surface Science
Volume178
Issue number1-4
DOIs
Publication statusPublished - Jul 2001
MoE publication typeA1 Journal article-refereed

Keywords

  • anisotropic wet chemical etching
  • cellular automaton
  • convex corner
  • KOH
  • mask
  • Monte-Carlo simulations
  • morphology
  • roughness
  • silicon
  • surface structure
  • topography

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