Anisotropic Si Reactive Ion Etching at Room Temperature

A. Malinin, T. Majamaa, A. Hovinen

Research output: Working paperProfessional

Original languageEnglish
Publication statusPublished - 1997
MoE publication typeD4 Published development or research report or study

Publication series

NameThe Second International Conference on Low Dimensional Structures and Devices, Lissabon 19-21 May 1997
PublisherDr. M. Henini

Keywords

  • electron beam lithography
  • fluorine process gases
  • reactive ion etching
  • silicon

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