@article{0f5dd4d7c7b441c1bf558e315b96c3e9,
title = "Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon",
keywords = "Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation, Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation, Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation",
author = "{von Gastrow}, Guillaume and Ramon Alcubilla and Pablo Ortega and Marko Yli-Koski and S{\`o}nia Conesa-Boj and {Fontcuberta i Morral}, Anna and Hele Savin",
year = "2015",
doi = "10.1016/j.solmat.2015.05.027",
language = "English",
volume = "142",
pages = "29--33",
journal = "Solar Energy Materials and Solar Cells",
issn = "0927-0248",
publisher = "Elsevier",
}