Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

Guillaume von Gastrow, Ramon Alcubilla, Pablo Ortega, Marko Yli-Koski, Sònia Conesa-Boj, Anna Fontcuberta i Morral, Hele Savin

Research output: Contribution to journalArticleScientificpeer-review

43 Citations (Scopus)
156 Downloads (Pure)
Original languageEnglish
Pages (from-to)29-33
Number of pages5
JournalSolar Energy Materials and Solar Cells
Volume142
DOIs
Publication statusPublished - 2015
MoE publication typeA1 Journal article-refereed

Keywords

  • Al2O3
  • atomic layer deposition
  • nano-texturing
  • negative charge
  • reactive ion etching
  • surface passivation

Equipment

OtaNano

Anna Rissanen (Manager)

Aalto University

Facility/equipment: Facility

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