An Atomic Layer Deposition Apparatus

Hulda Aminoff (Inventor), Pekka Soininen (Inventor), Pekka J Soininen (Inventor), Ville Miikkulainen (Inventor)

Research output: Patent

Abstract

An atomic layer deposition apparatus including an atomic layer deposition reactor and a reactor door. The reactor door is arranged against the end edge of the reactor in a closed position of the reactor. The apparatus having a cooling arrangement for cooling the reactor door having a shell structure surrounding the reactor from the outside of the reactor such that a cooling channel is formed between the shell structure and the at least one side wall of the reactor; a heat exchanger element arranged in the cooling channel in an area of the end edge; and a ventilation discharge connection in connection with the cooling channel provided at a distance from the edge end.

Original languageEnglish
Patent numberUS2022259733
IPCC23C 16/ 455 A I
Priority date26/06/2020
Publication statusPublished - 18 Aug 2022
MoE publication typeH1 Granted patent

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