Abstract
The invention relates to an atomic layer deposition apparatus comprising an atomic layer deposition reactor (1) and a reactor door (2) in connection with the opening. The reactor door (2) is arranged against the end edge (12) of the reactor (1) in a closed position of the reactor (1). The apparatus further comprising a cooling arrangement for cooling the reactor door (2) comprising a shell structure (3) surrounding the reactor (1) from the outside of the reactor (1) such that a cooling channel (4) is formed between the shell structure (3) and the at least one side wall (11) of the reactor (1); a heat exchanger element (6) arranged in the cooling channel (4) in an area of the end edge (12); and a ventilation discharge connection (5, 50) in connection with the cooling channel (4) provided at a distance from the edge end (12) of the reactor (1).
| Original language | English |
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| Patent number | FI129577 |
| IPC | C23C 16/ 455 A I |
| Priority date | 28/06/2019 |
| Publication status | Published - 13 May 2022 |
| MoE publication type | H1 Granted patent |