Amorphous Oxide Formation on NbAl(3) and TiAl due to Ion Implantion of (18)O

R.J.Jr. Hanrahan, E.D. Verink, E.O. Ristolainen, S.P. Withow

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationMRS Fall Meeting, 29-31 Dec., 1993
    Publication statusPublished - 1993
    MoE publication typeA4 Article in a conference publication


    • amorphous oxid, ion implantion, NbAl and TiAl alloys, SIMS

    Cite this