Amorphization of Silicon by High Dose Germanium Ion Implantation with no External Cooling Mechanism

Z. Xia, J. Saarilahti, Eero O. Ristolainen, Simo Eränen, Hannu Ronkainen, P. Kuivalainen, D. Paine, T. Tuomi

    Research output: Contribution to journalArticleScientificpeer-review

    4 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)321-330
    JournalApplied Surface Science
    Publication statusPublished - 1994
    MoE publication typeA1 Journal article-refereed


    • Amorphization
    • Germanium/silicon
    • Ion implantation
    • Silicon
    • SIMS

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