Ambient Condition Production of High Quality Reduced Graphene Oxide

Research output: Contribution to journalArticle

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Ambient Condition Production of High Quality Reduced Graphene Oxide. / Evlashin, Stanislav A.; Svyakhovskiy, Sergey E.; Fedorov, Fedor S.; Mankelevich, Yuri A.; Dyakonov, Pavel V.; Minaev, Nikita V.; Dagesyan, Sarkis A.; Maslakov, Konstantin I.; Khmelnitsky, Roman A.; Suetin, Nikolay V.; Akhatov, Iskander S.; Nasibulin, Albert G.

In: Advanced Materials Interfaces, Vol. 5, No. 18, 1800737, 21.09.2018, p. 1-7.

Research output: Contribution to journalArticle

Harvard

Evlashin, SA, Svyakhovskiy, SE, Fedorov, FS, Mankelevich, YA, Dyakonov, PV, Minaev, NV, Dagesyan, SA, Maslakov, KI, Khmelnitsky, RA, Suetin, NV, Akhatov, IS & Nasibulin, AG 2018, 'Ambient Condition Production of High Quality Reduced Graphene Oxide', Advanced Materials Interfaces, vol. 5, no. 18, 1800737, pp. 1-7. https://doi.org/10.1002/admi.201800737

APA

Evlashin, S. A., Svyakhovskiy, S. E., Fedorov, F. S., Mankelevich, Y. A., Dyakonov, P. V., Minaev, N. V., ... Nasibulin, A. G. (2018). Ambient Condition Production of High Quality Reduced Graphene Oxide. Advanced Materials Interfaces, 5(18), 1-7. [1800737]. https://doi.org/10.1002/admi.201800737

Vancouver

Evlashin SA, Svyakhovskiy SE, Fedorov FS, Mankelevich YA, Dyakonov PV, Minaev NV et al. Ambient Condition Production of High Quality Reduced Graphene Oxide. Advanced Materials Interfaces. 2018 Sep 21;5(18):1-7. 1800737. https://doi.org/10.1002/admi.201800737

Author

Evlashin, Stanislav A. ; Svyakhovskiy, Sergey E. ; Fedorov, Fedor S. ; Mankelevich, Yuri A. ; Dyakonov, Pavel V. ; Minaev, Nikita V. ; Dagesyan, Sarkis A. ; Maslakov, Konstantin I. ; Khmelnitsky, Roman A. ; Suetin, Nikolay V. ; Akhatov, Iskander S. ; Nasibulin, Albert G. / Ambient Condition Production of High Quality Reduced Graphene Oxide. In: Advanced Materials Interfaces. 2018 ; Vol. 5, No. 18. pp. 1-7.

Bibtex - Download

@article{641445b9afc748768b649e945f6cf50e,
title = "Ambient Condition Production of High Quality Reduced Graphene Oxide",
abstract = "Reduced graphene oxide (GO) becomes one of the most popular materials for applications in various optical, electronic, and sensor devices. Even though many methods are already reported for reduced graphene oxide synthesis, they usually raise issues related to their efficiency, quality, and environmental impact. This work demonstrates a simple, environmental friendly, and effective method for reducing graphene oxide under ambient conditions using nanosecond infrared laser irradiation. As a result, a Raman band intensity ratio of I(G)/I(D) of 4.59 is achieved with an average crystallite size of ≈90 nm. This graphene is of higher quality than what can be achieved with most of the existing methods. Additionally, the demonstrated reduction technique allows the selective reduction of graphene oxide and control the amount of functional groups on the surface of the material. Gas sensors fabricated according to the proposed technique efficiently detect NO2, NH3, and H2S with the sensitivity down to 10 ppm.",
keywords = "gas sensor, graphene oxide reduction, laser reduction",
author = "Evlashin, {Stanislav A.} and Svyakhovskiy, {Sergey E.} and Fedorov, {Fedor S.} and Mankelevich, {Yuri A.} and Dyakonov, {Pavel V.} and Minaev, {Nikita V.} and Dagesyan, {Sarkis A.} and Maslakov, {Konstantin I.} and Khmelnitsky, {Roman A.} and Suetin, {Nikolay V.} and Akhatov, {Iskander S.} and Nasibulin, {Albert G.}",
year = "2018",
month = "9",
day = "21",
doi = "10.1002/admi.201800737",
language = "English",
volume = "5",
pages = "1--7",
journal = "Advanced Materials Interfaces",
issn = "2196-7350",
publisher = "WILEY-BLACKWELL",
number = "18",

}

RIS - Download

TY - JOUR

T1 - Ambient Condition Production of High Quality Reduced Graphene Oxide

AU - Evlashin, Stanislav A.

AU - Svyakhovskiy, Sergey E.

AU - Fedorov, Fedor S.

AU - Mankelevich, Yuri A.

AU - Dyakonov, Pavel V.

AU - Minaev, Nikita V.

AU - Dagesyan, Sarkis A.

AU - Maslakov, Konstantin I.

AU - Khmelnitsky, Roman A.

AU - Suetin, Nikolay V.

AU - Akhatov, Iskander S.

AU - Nasibulin, Albert G.

PY - 2018/9/21

Y1 - 2018/9/21

N2 - Reduced graphene oxide (GO) becomes one of the most popular materials for applications in various optical, electronic, and sensor devices. Even though many methods are already reported for reduced graphene oxide synthesis, they usually raise issues related to their efficiency, quality, and environmental impact. This work demonstrates a simple, environmental friendly, and effective method for reducing graphene oxide under ambient conditions using nanosecond infrared laser irradiation. As a result, a Raman band intensity ratio of I(G)/I(D) of 4.59 is achieved with an average crystallite size of ≈90 nm. This graphene is of higher quality than what can be achieved with most of the existing methods. Additionally, the demonstrated reduction technique allows the selective reduction of graphene oxide and control the amount of functional groups on the surface of the material. Gas sensors fabricated according to the proposed technique efficiently detect NO2, NH3, and H2S with the sensitivity down to 10 ppm.

AB - Reduced graphene oxide (GO) becomes one of the most popular materials for applications in various optical, electronic, and sensor devices. Even though many methods are already reported for reduced graphene oxide synthesis, they usually raise issues related to their efficiency, quality, and environmental impact. This work demonstrates a simple, environmental friendly, and effective method for reducing graphene oxide under ambient conditions using nanosecond infrared laser irradiation. As a result, a Raman band intensity ratio of I(G)/I(D) of 4.59 is achieved with an average crystallite size of ≈90 nm. This graphene is of higher quality than what can be achieved with most of the existing methods. Additionally, the demonstrated reduction technique allows the selective reduction of graphene oxide and control the amount of functional groups on the surface of the material. Gas sensors fabricated according to the proposed technique efficiently detect NO2, NH3, and H2S with the sensitivity down to 10 ppm.

KW - gas sensor

KW - graphene oxide reduction

KW - laser reduction

UR - http://www.scopus.com/inward/record.url?scp=85053639765&partnerID=8YFLogxK

U2 - 10.1002/admi.201800737

DO - 10.1002/admi.201800737

M3 - Article

VL - 5

SP - 1

EP - 7

JO - Advanced Materials Interfaces

JF - Advanced Materials Interfaces

SN - 2196-7350

IS - 18

M1 - 1800737

ER -

ID: 28518650